Tantalum sputtering target

Tantalum sputtering target,Tantalum alloy target Material: R05200, R05400, R05252 (Ta-2.5W), R05255 (Ta-10W) Size: circular targets: Diameter 25mm up to 400mm xThickness 3mm up to 28mm rectangular targets:Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm Purity: >=99.95% or 99.99% Table 1: technology parameter Grade 3N, 3N5, 4N, with Ta99.99%min Recrystallization 95%min Grain size ASTM 4 or finer Surface finish 16Rms max. or Ra 0.4 ( RMS64 or better) Flatness 0.1mm or 0.15% max Tolerance +/-0.010" on all dimensions Table 2. Chemical composition: Chemistry % Designation Chief component Impurities maxmium Ta Nb Fe Si Ni W Mo Ti Nb O C H N Ta1 Remainder 0.004 0.003 0.002 0.004 0.004 0.002 0.03 0.015 0.004 0.0015 0.002 Ta2 Remainder 0.01 0.01 0.005 0.02 0.02 0.005 0.08 0.02 0.01 0.0015 0.01 TaNb3 Remainder 3.5 0.01 0.01 0.005 0.02 0.02 0.005 0.02 0.01 0.0015 0.01 TaNb20 Remainder 17.023.0 0.01 0.01 0.005 0.02 0.02 0.005 0.02 0.01 0.0015 0.01 Ta2.5W Remainder 0.005 0.003 0.002 3.0 0.006 0.002 0.04 0.015 0.005 0.0015 0.006 Ta10W Remainder 0.005 0.003 0.002 11 0.006 0.002 0.04 0.015 0.005 0.0015 0.006 Special requirements to be agreed on by the supplier and buyer of negotiations