QJX-4500 Metallurgisches Mikroskop

QVS-4500 industial microscope is equipped with a large moving range mechanical stage.Epi-illuminator, long working distance bright and dark field Infinite Plan objectives. Wide field eyepiece with clear images and good contrast. It is developed and aimed at the semiconductor industry, wafer manufactruing. Electronic in formation industry, metallurgical industry,and used as high grade industrial microscope. Bright&Dark field observation, EPI-polarizing and DIC observation and college and Universities to identify and analyze Wafer, FPD, Circuit Substrate, Precision moulds. Specification Viewing Head Compensation Free Trinocular Head,Inclined30°(50mm-75mm) Eyepiece WF10×/25mm WF×/20mm,crosshair with reticule 0.1mm Nosepiece Quintuple Nosepiece with DIC Jack Objective Long working distance bright and dark field Infinite Plan objectives:5×/0.1B.D/W.D.29.4mm 10×/0.25B.D/W.D16mm 20×/0.40B.D./W.D.10.6mm 40×/0.60B.D./W.D.5.4mm Stage Double layer mechanical stage Stage Size:350mm×310mm Moving Range:250mm×250mm Filter Flashboard type filters(grreen,blue,neutral) Focusing Coaxial coarse&fine focuing adjustment with rack and pinion mechanism Fine focusing scale value 0.002mm Light Source Epi-illumination:With aperture iris diaphragm and field iris Diaphragm,Halogen Bulb 12V/100W,AC85V-230V,Brightness Adjustable Polarizing Device Analyzer rotatable 360°,Polariaer&Analyzer can be moved in/out of the optical path Checking Tool 0.01mm Micrometer Optional Accessory Eyepiece:WF15×/17mm, WF20×/12.5mm 1.3Mega,2.0 Mega,3.0Mega,5.0Mega,pixels CMOS Digital camera eyepiece Long working distance bright and dark field Infinite Plan objectives:50×/0.55B.D/W.D5.1mm, 80×/0.75B.D/W.D.4mm, 100×/0.80B.D/W.D.3mm Two-dimensional measurement software Professional metallurgical image analysis software DIC(10X,20X,40X,100X) Photography attachment and CCD Adapter 0.5X,0.57X,0.75X Planish tool CCD Camera,colour1/3″ High resolution 520TV lines Characteristicsand description Adopt UIS High-resolution, Long working distance,and infinity light path correcting system objective imaging technologyExtending the multioplexing technology of objective,compatible infinity objective with all the observation methods.including bright & dark field observation,polarization and also provide with high clear and sharp image in each in each observation methodAspherical surface Kohler illumination,increasing the viewing brightnessWF10×(Φ25)super wide Eyepiece, long working distance metallurgical objective with bright and dark fieldThe Nosepiece can be equipped with detachable DIC differential interference device.