Nitrogen Trifluoride (NF3)

Nitrogen Trifluoride (NF3) It is a colorless toxic gas under normal temperature and pressure. Stable under normal temperature, but it will burn when it is heated or meets with flame, electric fire, even explosions, high oxidation ability, soluble in water. NF3 is widely used in electronic industry,semiconductor and solar photoelectricity industry etc.It is a good etching and cleaning gas for plasma CVD chamber with advantages of no remains,high etching speed and easy decompose. ----------------------------------------------------------------------------------------------------------------------------- PURITY≥ 99.999% Tetrafluoromethance < 700 ppmw <50 ppmw Nitrogen < 50 ppmw < 2 ppmw Oxygen < 50 ppmw < 2.5 ppmw Carbon Dioxide < 10 ppmw < 2 ppmw Water < 1 ppmv < 0.25ppmw Hydorgen Fluoride < 0.3 ppmw < 1.5 ppmw Sulfur Hexafluoride < 10 ppmw < 20 ppmw Nitrous Oxide < 10 ppmw < 3 ppmw Carbon Monoxide < 10 ppmw --------------------------------------------------------------------------------------------------------------------------------- Specific Volume: 5.4 cf/lb @NTP Boiling Point: -200 °F@ 1 Atm CAS No.: 7783-54-2 Hazards: Violent Combustion and High Pressure Safety Data: PEL - TWA: 10 ppm ACGIH - TLV: 10 ppm IDLH: 2,000 ppm Critical Temp.: -38.7 °F Critical Press.: 646.9 psia ------------------------------------------------------------------------------------------------------------------------------ Packing cylinder