Multi-function microwave plasma experiment

I. General description: This facility is jointly developed by Plasma Chemistry and Advanced Materials Province Key Laboratory of Wuhan institute of technology and us. 2.45GHz microwave generated by microwave source transmits along rectangular waveguide, passes through modulation short circuit plunger and finally in the water-cooled resonance cavity reaction chamber excites gas to form axisymmetric plasmoid. The following experiments may be made: Preparation of various functional thin-film materials (e.g. BN film, diamond thin-film and carbon nitride thin-film) on substrate (e.g. silicon chip) with microwave plasma chemical gas deposition process, microwave plasma etching processing experiment, as well as experiments such as material surface improvement, microwave plasma cleaning material surface and microwave plasma chemical synthesis and the experiments suitable for students in fields of physics, material, and chemical and for teachers scientific research. The facility will be advantageous to students to master the application of plasma technology. This facility additionally requires optical microscope, ultrasonic cleaner and gas supply and it is accompanied with substrate and fine diamond powder. Patent of utility model: ZL 2006 2 0102055.4. II. Characteristics: It has no inside electrode so as to avoid discharge contamination, has a wide working gas pressure range and high energy conversion efficiency and generates wide-ranged high-density plasma. It is equipped with two vertical cross transparent windows to directly observe discharge characteristics of the plasma. The microwave plasma reaches a sub-micrometer grade etching precision and is able to fast prepare various functional film materials. III. Technical parameters and performances: 1. Microwave source power: 0 800W, infinite adjustable output 2. Vacuum system: It uses spinning disk vacuum pump and single-phase 220V AC power supply and reaches limit vacuum 6×10-1 Pa. It uses the digital piezoresistive type vacuum gauge and the thermocouple vacuum gauge to measure background vacuum and working gas pressure. The vacuum is kept tight with metallic and rubber seals and the vacuum is coarsely adjusted with membrane valve and finely adjusted with micro-adjustment valve. The adjustment is fast, easy and stable. 3. Gas supply system: It is provided with two independent gas supply circuits and the flow rate is controlled with the rotor flow meter. 4.The built-in cooling water circulation system generates cooling water and cooling system ensures cooling water temperature below 30 without requirements on water resource. 5. Microwave transmission and microwave resonance cavity: It is equipped with circulator, water load and three-screw impedance adaptor to ensure safe working of microwave source and fitted with microwave reflection measuring system to make plasma absorb microwave energy as far as possible. The working pressure and limit pressure of the reaction chamber is several Pa to 10kPa and 6×10-1 Pa respectively. The quartz tube cavity of vacuum reaction chamber is Φ50mm and the substrate temperature range is 2001000. The substrate temperature is measured by thermocouple and adjusted through cooling water. The electromagnetic wave power is 0800W and the resistance of earth wire 3Ω.